Abstract:
HafSOx is a dielectric material that also functions as an insulator. It is able to be
spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead
it to a high dielectric constant, making it ideal for electronic devices through the use of lithography.
Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous
deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The
stripping phase is not well understood, prompting research interest.
Description:
Project Description: HafSOx is a dielectric material that also functions as an insulator. It is able to be
spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead
it to a high dielectric constant, making it ideal for electronic devices through the use of lithography.
Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous
deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The
stripping phase is not well understood, prompting research interest.
