Honors College Thesis

 

Thermal conductivity measurements of amorphous thin films on silicon via the 3ω method Public Deposited

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https://ir.library.oregonstate.edu/concern/honors_college_theses/k35698744

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  • Thermal transport properties of a material are often difficult to measure, especially for thin films, but they are important for materials that have applications in modern devices, such as nano-scale electronics, thermoelectrics, and thermally resistive coatings. In this thesis, we describe an apparatus developed to measure the thermal conductivity of bulk and thin film materials via the 3ω method and a procedure to construct the high quality microheaters needed for the measurement process. The theoretical basis of the 3ω method is derived in detail and we demonstrate how thermal properties are extracted from experimental data. To test the validity of the method, we measure the thermal conductivity of bulk Corning 1737 glass, a well established thermal standard; results indicate that the conductivity is 0.90 W m⁻¹ K⁻¹, consistent with the known value to within 2%. We also test the thermal conductivity of two types of bulk silicon and show that the thermal conductivity is strongly dependent on doping concentration. Amorphous aluminum phosphate (AlPO) films are also characterized; this material has potential use in microelectronics as nanometer-scale, high quality insulating films can be created with an all-aqueous spin coating technique. We show that ALPO films with thickness 50-200 nm have a thermal conductivity of 0.94(3) W m⁻¹ K⁻¹, comparable to other dielectrics currently used in the microelectronics industry.
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  • Funding for this project was provided by the Oregon State University URISC program,the Center for Sustainable Materials Chemistry, and NSF CHE-110263.
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