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Filtering by: Subject Ferroelectric thin films Remove constraint Subject: Ferroelectric thin films Advisor Wager, John F. Remove constraint Advisor: Wager, John F.

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  • Ferroelectric thin film development

    Creator:
    Harman, Taran V.
    Abstract:
    The long-term goal of the research project initiated with this thesis is the development of lead-free, fully-transparent ferroelectric devices, such as ferroelectric capacitors or ferroelectric-gate field-effect transistors. Ferroelectric materials exhibit spontaneous polarization with the application of an external electric field, which is persistent upon removal of the applied field, and...
    Resource Type:
    Masters Thesis
    Full Text:
    : Ferroelectric Thin Film Development . Abstract approved: John F. Wager The long-term goal of the research

  • Process development and modeling of thin-film transistors

    Creator:
    Hong, David
    Abstract:
    A class of high-performance thin-film transistor (TFT) channel materials has emerged involving oxides composed of heavy-metal cations (HMCs) with (n-1)d¹⁰ns⁰ (n≥4) electronic configurations. This thesis is devoted to the pursuit of three topics involving the development of these materials for TFT applications: modeling TFT currentvoltage characteristics, an exploratory method for...
    Resource Type:
    Masters Thesis
    Full Text:
    thin-film transistor (TFT) channel materials has emerged involving oxides composed of heavy-metal

  • Contact resistance and stability assessment of oxide-based thin film transistors

    Creator:
    Hung, Celia M.
    Abstract:
    This thesis focuses on two aspects of oxide-based thin-film transistors (TFTs), contact resistance and instability assessment. First, determination of the contact resistance of indium tin oxide (ITO) on two wide-band gap semiconductors, zinc oxide (ZnO) and indium gallium oxide (IGO), is attempted and the effects of contact resistance on device...
    Resource Type:
    Masters Thesis
    Full Text:
    . Title: Contact Resistance and Stability Assessment of Oxide-Based Thin Film Transistors Abstract

  • Internal charge-phosphor field analysis, electrical characterization, and aging studies of AC thin-film electroluminescent devices

    Creator:
    Abu-Dayah, Ahmad I.
    Resource Type:
    Masters Thesis
    Full Text:
    characterization, and aging studies of AC thin-film electroluminescent devices AN ABSTRACT OF THESIS OF Ahmad I

  • Electrical characterization and aging studies of ALE ZnS:Mn ACTFEL devices with varying phosphor thicknesses

    Creator:
    Shih, Shou-Po
    Resource Type:
    Masters Thesis
    Full Text:
    alternating-current thin-film electroluminescent (AC I FEL) devices grown by atomic layer epitaxy (ALE

  • Oxide phosphors deposited by activated reactive evaporation for ACTFEL device applications

    Creator:
    Yokoyama, Tomoe
    Abstract:
    The goal of this thesis study is to develop an activated reactive evaporation (ARE) system and to demonstrate its utility by fabricating-alternating current thin-film electroluminescent (ACTFEL) oxide phosphor devices. ARE entails evaporation in an activated gas. The main ARE system components are three thermal evaporation sources, a microwave power supply,...
    Resource Type:
    Masters Thesis
    Full Text:
    demonstrate its utility by fabricating-alternating current thin- film electroluminescent (ACTFEL) oxide

  • An n-sheet, state-space ACTFEL device model

    Creator:
    Hitt, John C.
    Abstract:
    The objective of the research presented in this thesis is to develop, implement, and demonstrate the utility of an n-sheet, state-space alternating-current thin-film electroluminescent (ACTFEL) device model. In this model, the phosphor layer is discretized into n + 1 layers, with band-to-band impact ionization, space charge creation/ annihilation, and luminescent...
    Resource Type:
    Dissertation
    Full Text:
    , and demonstrate the utility of an n-sheet, state-space alternating-current thin-film

  • Development of oxide semiconductors : materials, devices, and integration

    Creator:
    Chiang, Hai Q.
    Abstract:
    The aim of this dissertation is to develop oxide semiconductors by radio-frequency sputtering for thin-film transistor (TFT) applications. A variety of oxide semiconductors are used as the TFT channel layer, including indium gallium oxide (IGO), zinc tin oxide (ZTO), and indium gallium zinc oxide (IGZO). The variety of materials used...
    Resource Type:
    Dissertation
    Full Text:
    sputtering for thin-film transistor (TFT) applications. A variety of oxide semiconduc- tors are used as the

  • Fabrication and characterization of thin-film transistor materials and devices

    Creator:
    Hong, David
    Abstract:
    A class of inorganic thin-film transistor (TFT) semiconductor materials has emerged involving oxides composed of post-transitional cations with (n-1)d¹⁰ns⁰ (n≥4) electronic configurations. This thesis is devoted to the pursuit of topics involving the development of these materials for TFT applications: Deposition of zinc oxide and zinc tin oxide semiconductor layers...
    Resource Type:
    Dissertation
    Full Text:
    : Fabrication and Characterization of Thin-film Transistor Materials and Devices. Abstract approved: John F

  • Al-In-Sn-O thin-film transistors

    Creator:
    Stewart, Kevin A.
    Abstract:
    The aim of the research undertaken for this thesis was to develop a new high-performance amorphous oxide semiconductor (AOS) for use as a channel layer in a thin-film transistor (TFT). AOS TFTs offer higher electron mobility than the established amorphous silicon based technology. A new channel material comprised of aluminum...
    Resource Type:
    Masters Thesis
    Full Text:
    Al-In-Sn-O Thin-Film Transistors AN ABSTRACT OF THE