The aim of the research undertaken for this thesis was to develop a new high-performance amorphous oxide semiconductor (AOS) for use as a channel layer in a thin-film transistor (TFT). AOS TFTs offer higher electron mobility than the established amorphous silicon based technology. A new channel material comprised of aluminum...
The trend towards higher resolution, faster refresh rate active-matrix liquid-crystal displays (AMLCDs) as well as the emergence of active-matrix organic light-emitting diode (AMOLED) displays is driving the demand for amorphous oxide semiconductor thin-film transistors (AOS TFTs) with higher mobility. A physics-based model for carrier transport in an amorphous semiconductor is...
Alternating-current thin-film electroluminescent (ACTFEL) devices are used in the
formation of pixels in flat panel displays. ACTFEL flat panel displays have many
advantages over other flat panel technologies. Specifically, ACTFEL panels are emissive
displays, they have high brightness, wide viewing angles, and rugged construction.
Although much is already known about...
Current cadmium telluride and copper indium gallium diselenide thin-film solar cells
(TFSCs) utilize thick absorbers (2 - 4 μm). For efficient carrier extraction in these TFSCs,
the absorber layer requires high carrier mobilities and a long minority carrier lifetime, which
necessitates the use of a high purity, defect-free thin film....
Amorphous metal thin films (AMTFs) are of potential use for metal-insulator-metal (MIM) tunnel diode applications due to their ultra-smooth surfaces, a consequence of their amorphous microstructure. The objective of this thesis is to design a thermally-stable AMTF capable of maintaining MIM tunnel diode performance after a post-deposition anneal in excess...
A study of deep levels of the emitter region of a
heterojunction bipolar transistor is investigated using deep
level transient spectroscopy (DLTS), deep level admittance
spectroscopy (DLAS), thermally stimulated capacitance
(TSCAP), and capacitance-voltage (C-V) profiling. The DX
center, with an activation energy of 0.45 eV, is the only
deep level...
Amorphous oxide semiconductors (AOSs) are of great current interest for thin-film transistor (TFT) channel layer applications. In particular, indium gallium zinc oxide (IGZO) is under intense development for commercial applications because of its demonstrated high performance at low processing temperatures. The objective of the research presented in this thesis is...
The focus of this thesis is the investigation of thin-film transistors (TFTs) based on amorphous oxide semiconductors (AOSs) in two circuit applications. To date, circuits implemented with AOS-based TFTs have been primarily enhancement-enhancement inverters, ring oscillators based on these inverters operating at peak frequencies up to ~400 kHz, and two-transistor...
A class of inorganic thin-film transistor (TFT) semiconductor materials has emerged involving oxides composed of post-transitional cations with (n-1)d¹⁰ns⁰ (n≥4) electronic configurations. This thesis is devoted to the pursuit of topics involving the development of these materials for TFT applications: Deposition of zinc oxide and zinc tin oxide semiconductor
layers...