Metal oxide clusters are promising inorganic photoresists in next generation nanomanufacturing because of their potential for high-resolution and low line-edge roughness patterning, and exceptional sensitivity to extreme ultraviolet (EUV) radiation. In EUV patterning, absorption of EUV radiation leads to electron emission that serve as a primary species for driving radiation...
The authors present a facile, low-cost methodology to fabricate high-performance In-Ga-Zn-O (IGZO) bottom contact, bottom gate thin-film transistors (TFTs) by soft lithography. The IGZO channel and indium tin oxide (ITO) source and drain were patterned using microcontact printing of an octadecylphosphonic acid self-assembled monolayer (SAM). A polymer stamp was used...
In this paper we present a novel fabrication technique that utilizes polycaprolactone (PCL) as bonding media due to its low melting temperature property. PCL is biodegradable polyester with a melting point of 60°C, and a glass transition temperature of -60°C [1-10]. It is employed as a rapid bonding technique in...
A system of Photoactuated Droplet Microfluidics (PDM), in which a droplet of
fluid is moved by way of the manipulation of the wettability of a spiropyran
functionalized surface via irradiation with ultraviolet and visible light, was proposed. The
photochromic behaviors of several species of spiropyran were studied and a procedure...