The performance of thin film metal-insulator-metal (MIM) diodes is investigated for a variety of large and small electron affinity insulators using ultrasmooth amorphous metal as the bottom electrode. Nb2O5, Ta2 O5, ZrO2, HfO2, Al2 O3, and SiO2 amorphous insulators are deposited via atomic layer deposition (ALD). Reflection electron energy loss...
This project examines the results of current-voltage conduction mechanism analysis techniques simulated under assumed conduction conditions. Thermionic emission and Fowler-Nordheim tunneling conditions are simulated and analyzed. The resulting plots show how devices behave under different condition mechanisms. The effects of different conduction mechanisms on the results of various analysis techniques...