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  • Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures

    Creator:
    Venkataraman, Arjun
    Abstract:
    Plasma etching of polymers is an important process in the fabrication of integrated circuits, printed circuit boards and other emerging technologies. High rates can be obtained using oxygen diluted with a fluorine-containing gas, most commonly CF₄. In this thesis, two less studied fluorinated gases, NF₃ and SF₆ are investigated. Polyphenylene...
    Resource Type:
    Masters Thesis
    Full Text:
    . Koretsky Plasma etching of polymers is an important process in the fabrication of integrated circuits

  • Modeling and simulation of CF₄/O₂ microwave plasma afterglows

    Creator:
    Camara, Amadou Tidiane
    Abstract:
    A gas phase kinetic model for the CF₄/O₂ microwave discharge plasma and afterglow of our laboratory has been developed. A reaction pathway identifying the major chemical reactions is proposed. The rate coefficients of the electron impact dissociation reactions are determined at three different plasma powers using both published electron molecule...
    Resource Type:
    Masters Thesis
    Full Text:
    functionality of the IC. One such challenge will originate from plasma assisted etching. Plasma etching is