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Filtering by: Subject Plasma etching -- Mathematical models

Modeling and simulation of CF₄/O₂ microwave plasma afterglows

Creator:

Camara, Amadou Tidiane

Abstract:

A gas phase kinetic model for the CF₄/O₂ microwave discharge plasma and afterglow of our laboratory has been developed. A reaction pathway identifying the major chemical reactions is proposed. The rate coefficients of the electron impact dissociation reactions are determined at three different plasma powers using both published electron molecule...

Resource Type:

Masters Thesis