A gas phase kinetic model for the CF₄/O₂ microwave discharge plasma and afterglow of our laboratory has been developed. A reaction pathway identifying the major chemical reactions is proposed. The rate coefficients of the electron impact dissociation reactions are determined at three different plasma powers using both published electron molecule...
Plasma etching of polymers is an important process in the fabrication of
integrated circuits, printed circuit boards and other emerging technologies. High rates
can be obtained using oxygen diluted with a fluorine-containing gas, most commonly
CF₄. In this thesis, two less studied fluorinated gases, NF₃ and SF₆ are investigated.
Polyphenylene...