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Plasma etching
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Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream m...
Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and...
Modeling and simulation of CF₄/O₂ microwave plasma afterglows
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Academic Affiliation
Chemical Engineering
3
Advisor
Koretsky, Milo D.
3
Commencement Year
Commencement Year range begin
–
Commencement Year range end
Current results range from
1998
to
2005
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Creator
Camara, Amadou Tidiane
1
Hsu, Chia Chang
1
Venkataraman, Arjun
1
Date
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–
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Current results range from
1997
to
2004
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Decade
2000-2009
1
1990-1999
2
Degree Field
Chemical Engineering
3
Degree Level
Master's
2
Doctoral
1
Degree Name
Master of Science (M.S.)
2
Doctor of Philosophy (Ph.D.)
1
Language
English [eng]
3
Non-Academic Affiliation
Oregon State University. Graduate School
3
Peer Reviewed
No
3
Resource Type
Masters Thesis
2
Dissertation
1
Rights Statement
Copyright Not Evaluated
2
In Copyright
1
Subject
Microwave plasmas
2
Plasma etching
2
Afterglow (Physics) -- Mathematical models
1
Plasma etching -- Mathematical models
1