The selective masking effect of a thermally grown layer of silicon
dioxide has been widely utilized as a technique for controlling the
geometry and impurity concentration in semi-conductor device technology.
It is also recognized that the passivation of the silicon surface
by the vitreous silicon dioxide envelope protects the underlying...
A technique was investigated in which a silicon crystal was
used as a very sensitive detector of sub-nanogram quantities of
boron. The unknown quantity of boron was spread uniformly on
the surface of an n-type silicon wafer which was then baked for
diffusion. The measured depth of the p-n junction...