Conduction processes in metal–insulator–metal diodes with Ta₂O₅ and Nb₂O₅ insulators deposited by atomic layer deposition Public Deposited

http://ir.library.oregonstate.edu/concern/articles/02870x65b

This is the publisher’s final pdf. The article is copyrighted by the American Vacuum Society and published by the American Institute of Physics Publishing. It can be found at:  http://scitation.aip.org/content/avs/journal/jvsta.

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  • Conduction processes in metal–insulator–metal diodes with Ta2O5 and Nb2O5 insulators deposited by atomic layer deposition
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  • Alimardani, N., McGlone, J. M., Wager, J. F., & Conley Jr, J. F. (2013). Conduction processes in metal–insulator–metal diodes with Ta₂O₅ and Nb₂O₅ insulators deposited by atomic layer deposition. Journal of Vacuum Science & Technology A, 32(1), 01A122. doi:10.1116/1.4843555
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