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Atomic layer deposition of bismuth oxide using Bi(OCMe₂ [superscript i]Pr)₃ and H₂O Public Deposited
https://ir.library.oregonstate.edu/concern/articles/b8515q34k
This is the publisher’s final pdf. The article is copyrighted by the American Vacuum Society and published by the American Institute of Physics Publishing. It can be found at: http://scitation.aip.org/content/avs/journal/jvsta.
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AustinDustinElectEngCompSciAtomicLayerDeposition.pdf | 2017-07-26 | Public |
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