Other Scholarly Content

 

The effects of soaking HafSOx films in NaOH over varying time Public Deposited

Downloadable Content

Download PDF
https://ir.library.oregonstate.edu/concern/defaults/8p58pf525

Descriptions

Attribute NameValues
Creator
Abstract
  • HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography. Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The stripping phase is not well understood, prompting research interest.
Resource Type
Date Available
Date Issued
Degree Level
Degree Name
Non-Academic Affiliation
Rights Statement
Funding Statement (additional comments about funding)
  • Center for Sustainable Materials Chemistry, National Science Foundation
Publisher
Peer Reviewed
Language
Replaces
Additional Information
  • description.provenance : Made available in DSpace on 2014-06-05T17:43:46Z (GMT). No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)
  • description.provenance : Submitted by Stefan Lucchini (lucchins@onid.orst.edu) on 2014-06-04T21:06:19Z No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)
  • description.provenance : Approved for entry into archive by Patricia Black(patricia.black@oregonstate.edu) on 2014-06-05T17:43:46Z (GMT) No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)

Relationships

Parents:

This work has no parents.

In Collection:

Items