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The effects of soaking HafSOx films in NaOH over varying time Public Deposited

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https://ir.library.oregonstate.edu/concern/defaults/wh246t61d

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  • HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography. Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The stripping phase is not well understood, prompting research interest.
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  • National Science Foundation
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  • description.provenance : Submitted by Stefan Lucchini (lucchins@onid.orst.edu) on 2012-06-07T23:37:15Z No. of bitstreams: 1 Soaking_films.ppt: 481792 bytes, checksum: 55e3946f24284ee094e853f327f5e405 (MD5)
  • description.provenance : Approved for entry into archive by Sue Kunda(sue.kunda@oregonstate.edu) on 2012-06-13T00:08:59Z (GMT) No. of bitstreams: 1 Soaking_films.ppt: 481792 bytes, checksum: 55e3946f24284ee094e853f327f5e405 (MD5)
  • description.provenance : Made available in DSpace on 2012-06-13T00:08:59Z (GMT). No. of bitstreams: 1 Soaking_films.ppt: 481792 bytes, checksum: 55e3946f24284ee094e853f327f5e405 (MD5)

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