On the Properties and Characteristics of Solution Processed Hafnium Based Thin-Films from Aqueous Precursors Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/2801pn072

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  • Aqueous hydroxo Hf nanoclusters enable studies to identify and codify steps in the deposition of Hf-based oxide thin films from solution precursors. HfOCl2 reacts with combinations of H2O2(aq)
  • Aqueous hydroxo Hf nanoclusters enable studies to identify and codify steps in the deposition of Hf-based oxide thin films from solution precursors. HfOCl2 reacts with combinations of H2O2(aq), acids, and TMAH to produce polymetal species at high pH and low pH. X-ray scattering and spectroscopic methods reveal the nature of these species in solution, while temperature-programmed desorption coupled with a suite spectroscopic techniques detail their chemical changes as they transition to condensed thin films. Three precursors were studied in this work:• hafnium peroxide hydroxide nitrate Hf(O2)0.5(OH)1.8(NO3)1.2 (HafNOx) • the photoresist Hf(O2)0.5(OH)1.6(SO4)0.7 (HafSOx)• the hexameric cluster ((CH3)4N)6Hf6(O2)6(OH)18 (TMAHfOx).
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