Graduate Thesis Or Dissertation
 

Layout dependent and bias independent scalable substrate model for RF MOSFETs

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  • The dependence of the substrate resistance, R[subscript sub], for MOS transistor RF modeling on transistor biasing and layout is studied from device simulations and measurements. Though R[subscript sub] is found to be bias dependent, the error incurred by assuming a constant value equal to the DC resistance is not significant. A scalable model for R[subscript sub] of multiple gate fingers is developed. This model is simple to extract and gives good agreement for the output admittance of a MOSFET. The model is validated by measurements on DC test structures fabricated in a TSMC 0.35 μm CMOS process. The dependence of Rb on transistor dimensions and the location of substrate contacts with respect to device active area is also presented. A low noise amplifier (LNA) is designed and fabricated in the 0.35 μm TSMC process to show the effect of R[subscript sub] on the performance of a LNA.
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