Effect of cosputtered catalyst on growth and alignment of carbon nanotubes by plasma enhanced chemical vapor deposition Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/5x21th48s

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  • The effect of cosputtered catalyst on growth and alignment of carbon nanotubes (CNTs) grown by plasma enhanced chemical vapor deposition (PECVD) was investigated. Aligned CNTs were observed using a cosputtered catalytic metal deposited directly on boro-aluminosilicate glass. Catalytic metal alloys were sputtered directly onto the substrate using magnetron sputtering. Deposition occurred at powers between 20-300 Watts and pressures between 5-20 mTorr. The cosputtered metal is composed of nickel, the catalytic metal, and titanium. Catalyst layer morphologies are analyzed using a atomic force microscope (AFM). PECVD was used to grow CNTs with NH₃ and C₂H₂ feed gases. Growth occurred at powers between 100-250 Watts, temperatures between 500°C -750°C, and pressures between 1.8-5.0 Torr. The effect of alloy composition and PECVD growth conditions were analyzed using a scanning electron microscope (SEM) and a transmission electron microscope (TEM). Aligned CNTs were grown on the cosputtered catalyst with extremely high growth densities and growth rates up to 5.0 μm/min. Growth rates and CNT diameters are directly related to catalyst morphologies. The alloyed catalyst showed increased adhesion when compared to a pure nickel film. This process eliminates the need to deposit an underlying layer on glass and plastic materials, and leads to increased control over catalyst morphology and CNT growth.
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