Two-dimensional temperature model for target materials bombarded by ion beams Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/6w924g07q

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  • The ion implantation process is a very precise, controllable, and reproducible method used to enhance material properties of finished components such as ball bearings. Essentially, the target material is bombarded by accelerated ions to form a thin alloyed layer in the substrate. As the ions deposit their kinetic energy in the target it begins to heat up. To prevent thermal distortion in the finished pieces the ion implantation is performed at dose levels (dependent on the ion fluence and time duration of implantation) to insure that the target pieces stay at relatively low temperatures. Consequently, the low temperature requirement for many applications limits the economic, and probably, the physical success of ion implantation. The purpose of this study was to show the applicability of using a two-dimensional computer code developed to model plasma disruptions and subsequent energy deposition on a fusion reactor first wall to calculate surface and bulk temperature information during ion implantation. In turn the code may assist researchers pursuing development of adequate cooling for target materials in an attempt to overcome the low temperature constraint. All data supported the hypotheses that the two-dimensional code previously developed for fusion reactor applications was adequate to model the ion implantation process.
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  • File scanned at 300 ppi (Monochrome, 256 Grayscale) using Capture Perfect 3.0 on a Canon DR-9050C in PDF format. CVista PdfCompressor 4.0 was used for pdf compression and textual OCR.
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