Refractory Amorphous Metal Thin Films Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/7d278x50d

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  • Amorphous metal thin films lack the grain boundaries and dislocations present in crystalline metal films. As a result, amorphous metal films can be more mechanically robust, atomically smooth, and more resistant to chemical attack than crystalline metals. However, amorphous metals are meta-stable and subject to crystallization upon heating, thus limiting their usefulness in applications where materials processing and or environmental conditions involve the heating of materials to high temperatures. This thesis explores the relationship between composition and thermal stability in an attempt to find amorphous metal materials that can resist crystallization at higher temperature. As a result, a new class of tantalum and silicon-based amorphous metal film materials has been designed, including TaNiSi, TaMoSi, and TaWSi. The effect of both refractory metal and metalloid content is tested and discussed as the morphology, thermal stability, electrical properties, and thermal oxidation of amorphous metal films are characterized.
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  • description.provenance : Approved for entry into archive by Laura Wilson(laura.wilson@oregonstate.edu) on 2017-04-04T21:08:16Z (GMT) No. of bitstreams: 2 license_rdf: 1232 bytes, checksum: bb87e2fb4674c76d0d2e9ed07fbb9c86 (MD5) OlsenKristopherR2017.pdf: 2607633 bytes, checksum: ab06e0955f64bdc5cda1ada883612a84 (MD5)
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