Graduate Thesis Or Dissertation
 

The concentration profile of diffused radio-active antimony in a silicon-dioxide layer

Público Deposited

Contenido Descargable

Descargar PDF
https://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/cc08hh86h

Descriptions

Attribute NameValues
Creator
Abstract
  • The selective masking effect of a thermally grown layer of silicon dioxide has been widely utilized as a technique for controlling the geometry and impurity concentration in semi-conductor device technology. It is also recognized that the passivation of the silicon surface by the vitreous silicon dioxide envelope protects the underlying surface from damage during the diffusion process. Thus indirectly it helps in improving the device parameters, like current amplification factor, the reverse current and the breakdown voltage. In spite of its very wide application in device design the physics of the effect is hardly understood. Very little work has been done in this field. The mechanism of the chemical reduction of the impurity oxide in the silicon dioxide layer and its distribution therein should have a strong influence on the concentration of the impurity in silicon. The present endeavor was concerned with finding the distribution of antimony, one of the donor elements, in the oxide layer. The experimental evidence indicates that the migration of antimony through silicon dioxide is a diffusion controlled reaction and that its concentration profile can be broken up into two regions. The diffusion follows an approximate erfc distribution in the first region with diffusion constant = 7.40 x 10⁻¹⁵ cm²/sec. The second region, however, shows a saturation behavior.
Resource Type
Fecha Disponible
Fecha de Emisión
Degree Level
Degree Name
Degree Field
Degree Grantor
Commencement Year
Advisor
Academic Affiliation
Non-Academic Affiliation
Subject
Declaración de derechos
Publisher
Peer Reviewed
Language
Digitization Specifications
  • File scanned at 300 ppi using ScandAll PRO 1.8.1 on a Fi-6770A in PDF format. CVista PdfCompressor 4.0 was used for pdf compression and textual OCR.
Replaces

Relaciones

Parents:

This work has no parents.

En Collection:

Elementos

Miniatura Título Fecha de subida Visibilidad Acciones
file details KhannaSatyaP1964.pdf 2017-08-04 Público Descargar