Development of Amorphous Metal Thin Films for Thermal Inkjet Printing and Microelectronics Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/hq37vr534

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  • Due to a lack of grain boundaries, an amorphous metal thin film (AMTF) possesses advantageous mechanical properties and enhanced chemical stability that is potentially useful for thermal inkjet (TIJ) printing applications. The use of an AMTF as a TIJ resistor or cavitation plate could lead to a thinner TIJ cavitation plate and improved thermal performance. However, if an AMTF is to be used as in a TIJ application, it must remain amorphous during TIJ operation. Six new Ta-based AMTFs are investigated and are found to remain amorphous up to temperatures in excess of 600 °C. AMTFs prepared using a sputter target composition of Ta₃₀W₃₀Si₄₀ possess the highest thermal stability, remaining amorphous to a temperature of 1000 to 1100 °C in vacuum. Additionally, this AMTF forms a stable surface oxide when annealed in oxygen up to 700 °C. To demonstrate TIJ feasibility, Ta₃₀W₃₀Si₄₀ resistors are fabricated and stressed in an open-pool test bed. Ta₃₀W₃₀Si₄₀ AMTFs remain amorphous after testing to > 10⁷ pulses. This suggests that Ta₃₀W₃₀Si₄₀ is a promising AMTF candidate material for TIJ applications. Ta-based AMTFs are also employed as bottom electrodes in metal-insulator-metal tunnel diodes in order to demonstrate their potential for microelectronic applications.
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