Graduate Thesis Or Dissertation
 

Photoresist and ion-exchange chemistry of HafSOx

Public Deposited

Downloadable Content

Download PDF
https://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/qr46r2982

Descriptions

Attribute NameValues
Creator
Abstract
  • The chemistry of hafnium oxide based and materials are described in the context of ion exchange and lithography. HafSOx, represented by the composition HfO₂₋[subscript x](SO₄)x, is described to possess a significant capacity towards ion exchange in acidic and basic solutions, enabling films of HafSOx to be cleanly and readily be converted to oxide films by neutralization. The optical properties, composition and morphology of these oxide films are characterized. The fabrication of mixed metal oxide films is demonstrated via solution and ion exchange routes. This thesis also explores the photoresist chemistry of HafSOx resists. A photoreaction mechanism based on the decomposition of peroxide is proposed. In addition, the patterning of HafSOx films by 193 nm, extreme ultraviolet (EUV) and electron beam radiation is described, and the influence of composition on its photoresist properties is studied.
License
Resource Type
Date Available
Date Issued
Degree Level
Degree Name
Degree Field
Degree Grantor
Commencement Year
Advisor
Committee Member
Academic Affiliation
Non-Academic Affiliation
Subject
Rights Statement
Publisher
Peer Reviewed
Language
Replaces

Relationships

Parents:

This work has no parents.

In Collection:

Items

Thumbnail Title Date Uploaded Visibility Actions
file details TeleckyAlanJ2012.pdf 2017-08-03 Public Download