Graduate Thesis Or Dissertation
 

Design, fabrication and characterization of complementary heterojunction field effect transistors

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  • Complementary delta-doped AlGaAs/GaAs Heterojunction Field Effect Transistor (CHFET) devices and circuits were fabricated using MBE and a 2μ non-planar gate recess process. Several schemes were used in an attempt to improve the performance of the p-channel HFETs. These included delta-doping, carbon-doping and dipole-doping. Circuits and individual n- and p- channel devices were fabricated on a stacked delta-doped complementary structure. The circuits failed to perform due to complications with adjusting the threshold voltage. However, Individual devices were successfully characterized, p-channel devices with extrinsic transconductances up to 14 mS/mm, n-channel devices with extrinsic transconductances up to 120 mS/mm and a unity power gain bandwidth of 5.5 GHz.
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  • File scanned at 300 ppi (Monochrome, 8-bit Grayscale) using ScandAll PRO 1.8.1 on a Fi-6670 in PDF format. CVista PdfCompressor 4.0 was used for pdf compression and textual OCR.
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