Design, fabrication, and testing of inhomogeneous dielectrics Public Deposited

http://ir.library.oregonstate.edu/concern/graduate_thesis_or_dissertations/z029p709s

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  • In this thesis the concept of inhomogeneous dielectrics is demonstrated for various optical coating applications. Compositionally-varying silicon oxynitride (SiON) dielectric layers, with the refractive index varying as a function of position, are grown by computer-controlled plasma-enhanced chemical vapor deposition (PECVD) using silane, nitrogen, and nitrous oxide reactant gases. Compositionally graded and superlattice-like SiON layers are grown and their compositional profiles are confirmed by Auger electron spectroscopy sputter profiling. Inhomogeneous antireflection coatings and rugate filters, with sinusoidally varying refractive index profiles, are designed and fabricated and their measured spectral responses are found to be in excellent agreement with simulated results. Alternating-current thin film electroluminescent (ACTFEL) devices with multiple layer dielectrics also are designed, fabricated, and the insulating layers are shown to increase the optical outcoupling efficiency of an ACTFEL devices by approximately 14 % compared to that of a conventional ACTFEL structure.
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