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- Scholars Archive Admin
- Date Uploaded
- 2017-11-06
- Date Modified
- 2017-11-06
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File Format: pdf (Portable Document Format)File Title: Microsoft Word - LinShijia2017.docxPage Count: 87File Size: 7193981Original Checksum: 8f86dc8f824b9a3ca655182bb23e9bacMime Type: application/pdf
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User Scholars Archive Admin has attached LinShijia2017.pdf to Atomic Layer Deposition (ALD) Process Development of Nb-doped TiO₂ as a Transparent Conducting Oxide (TCO) and ALD of HfO₂/Nb₂O₅ Bilayers as Insulating Barriers for Metal/Insulator/Insulator/Metal (MIIM) Diodes |
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