Undergraduate Thesis Or Project

 

Soaking_films.pdf Public Deposited

Downloadable Content

Download PDF
https://ir.library.oregonstate.edu/concern/undergraduate_thesis_or_projects/nk322f73z

Descriptions

Attribute NameValues
Creator
Abstract
  • HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography. Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The stripping phase is not well understood, prompting research interest.
Keyword
Rights Statement
Additional Information
  • description.provenance : Made available in DSpace on 2014-06-05T17:43:46Z (GMT). No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)
  • description.provenance : Submitted by Stefan Lucchini (lucchins@onid.orst.edu) on 2014-06-04T21:06:19Z No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)
  • description.provenance : Approved for entry into archive by Patricia Black(patricia.black@oregonstate.edu) on 2014-06-05T17:43:46Z (GMT) No. of bitstreams: 1 Soaking_films.ppt: 528896 bytes, checksum: a09883c43a505007cb9d222ae0a5df30 (MD5)

Relationships

Parents:

Items