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The effects of soaking HafSOx films in NaOH over varying time

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dc.creator Lucchini, Stefan
dc.date.accessioned 2012-06-13T00:08:59Z
dc.date.available 2012-06-13T00:08:59Z
dc.date.issued 2012-06-12
dc.identifier.uri http://hdl.handle.net/1957/29828
dc.description Project Description: HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography. Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The stripping phase is not well understood, prompting research interest. en_US
dc.description.abstract HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography. Additionally, it is environmentally friendly, has low fabrication costs due to its ability to use aqueous deposition, and is “future proof” in its abilities to be use in theoretical lithography techniques. The stripping phase is not well understood, prompting research interest. en_US
dc.description.sponsorship National Science Foundation en_US
dc.language.iso en_US en_US
dc.subject HafSOx en_US
dc.subject Dielectrics en_US
dc.title The effects of soaking HafSOx films in NaOH over varying time en_US
dc.type Presentation en_US
dc.description.digitization Original submission was .ppt. File was converted to .pdf using Microsoft PowerPoint for Mac 2011, Version 14.2.1. en_US


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