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Filtering by: Committee Member Geldhof, G. John Remove constraint Committee Member: Geldhof, G. John Advisor Conley, John F., jr. Remove constraint Advisor: Conley, John F., jr. Decade 2020-2029 Remove constraint Decade: 2020-2029

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  • Atomic Layer Processing for Next-Generation Microelectronic Materials

    Creator:
    Holden, Konner E. K.
    Abstract:
    Atomic layer deposition (ALD) is an enabling technique for many new micro- and nanoscale technologies. The self-limiting surface chemical reactions by which ALD fundamentally operates give rise to uniquely high precision (atomic) control over deposited film thickness, uniformity over large areas, and conformality over complex and extreme topographies. One such...
    Resource Type:
    Dissertation
    Full Text:
    : ______________________________________________________ John F. Conley, Jr. Atomic layer deposition (ALD) is an enabling technique for many