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Filtering by: Committee Member Plant, Tom Advisor Conley, John F., jr. Peer Reviewed No

Atomic layer deposition of nanolaminate high-κ gate dielectrics for amorphous-oxide semiconductor thin film transistors

Creator:

Triska, Joshua B.

Abstract:

Nanolaminate dielectrics combine two or more insulating materials in a many-layered film. These structures can be made to significantly outperform films composed of a single one of their constituent materials by adjusting the composition ratio, arrangement, and size of the component layers. In this work, atomic layer deposition (ALD) is...

Resource Type:

Masters Thesis