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Filtering by: Creator Groner, Michael Remove constraint Creator: Groner, Michael Advisor Conley, John F., jr. Remove constraint Advisor: Conley, John F., jr.

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  • Atomic Layer Processing for Next-Generation Microelectronic Materials

    Creator:
    Holden, Konner E. K.
    Abstract:
    Atomic layer deposition (ALD) is an enabling technique for many new micro- and nanoscale technologies. The self-limiting surface chemical reactions by which ALD fundamentally operates give rise to uniquely high precision (atomic) control over deposited film thickness, uniformity over large areas, and conformality over complex and extreme topographies. One such...
    Resource Type:
    Dissertation
    Full Text:
    professionals that we become. Thank you to my senior cohorts: Dr. Dustin Z. Austin, Michael Hayes and Dr

  • Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors

    Creator:
    Austin, Dustin Z.
    Abstract:
    Back end of line (BEOL) metal-insulator-metal capacitors (MIMCAPs) have become a core passive component in modern integrated circuits. International Technology Roadmap for Semiconductors (ITRS) projections for scaling of analog/mixed-signal MIMCAP applications require simultaneously increasing capacitance density while maintaining low leakage current density and low voltage nonlinearity (characterized by the quadratic...
    Resource Type:
    Dissertation
    Full Text:
    with ALD processing in chapter 4. Michael Hayes for assistance with XRD in chapter 5. Konner Holden