This thesis presents some experimental results for
producing controlled PN and NPN diffused structures in
silicon by varying the strength of the diffusion sources.
Boron diffusions were carried out in a N₂ atmosphere at
1200°C with 10%, 20%, 30% and 40% B₂0₃ in silicic acid as
sources. Phosphorus diffusions were...
Some important factors that affect the dimensional
control of oxide films on silicon were studied. Both N- and
P-type silicon with resistivities in the range of
0.014 to 200 ohm-cm and a (111) surface orientation
were employed in this experiment. The etching rates of
silicon dioxide in hydrofluoric acid (111)...
The
experimental
procedure
for
evaporating
silicon
monoxide
together
with
the
methods
for
measuring
the film
thickness
have
been
investigated.
The
effects
of
various
process
parameters
on
the
rate
of
deposition,
such
as
source
temperature
and
source-substrate
distance,
have
been
studied.
The
uniformity
of
silicon
monoxide
films
deposited
by
this
particular...
The experimental procedure for reactively sputtering
films of silicon nitride together with the methods for
measuring the film thickness have been investigated.
Some of the properties of these nitride films were studied.
These properties included: infrared spectrum,
etching properties, and index of refraction. The adherence
of the films was also...
Vacuum evaporated dielectrics for use in MOS structures
were studied in this research project. Dielectric
films were deposited on substrates by electron bombardment
evaporation of sapphire and quartz source materials.
These deposited films were studied using infrared spectroscopy,
index of refraction, density, and dielectric constant
measurements. Etching tests were also...