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Filtering by: Subject Photolithography Committee Member Herman, Gregory S.

Metal-oxo Clusters as Novel Photolithographic Materials: How Understanding the Chemistry of HafSOx Informs Next-Generation Patterning Systems

Creator:

Amador, Jenn M.

Abstract:

The solution chemistry and kinetic behavior of hafnium peroxy sulfate solutions ("HafSOx") is described in terms of peroxide content and solution speciation. Additionally, thin film behavior, including thermal behavior and solubility, is characterized, and a mechanism of patterning is presented, as well as parameters that should be considered when looking...

Resource Type:

Dissertation

Full Text:

that shift are critically important. Photolithography depends on sharp contrast between the soluble