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Filtering by: Creator Conley, John F., jr. Date issued sim 2013-12-09

Atomic layer deposition of bismuth oxide using Bi(OCMe₂ [superscript i]Pr)₃ and H₂O

Creator:

Austin, Dustin Z., Allman, Derryl, Price, David, Hose, Sallie, Saly, Mark, and Conley, John F., Jr.

Abstract:

Bismuth oxide thin films were deposited by atomic layer deposition using Bi(OCMe₂ [superscript i]Pr)₃ and H₂O at deposition temperatures between 90 and 270°C on Si₃N₄, TaN, and TiN substrates. Films were analyzed using spectroscopic ellipsometry, x-ray diffraction, x-ray reflectivity, high-resolution transmission electron microscopy, and Rutherford backscattering spectrometry. Bi₂O₃ films deposited...

Resource Type:

Article