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  • Reactively sputtered films of silicon nitride for diffusion masking

    Creator:
    Delzer, Dennis Richard
    Abstract:
    The experimental procedure for reactively sputtering films of silicon nitride together with the methods for measuring the film thickness have been investigated. Some of the properties of these nitride films were studied. These properties included: infrared spectrum, etching properties, and index of refraction. The adherence of the films was also...
    Resource Type:
    Masters Thesis
    Full Text:
    thesis. Also, gratitude is expressed to Professor John C. Decius for his help in obtaining the

  • Vacuum evaporated dielectrics in MOS structures

    Creator:
    Delzer, Dennis Richard
    Abstract:
    Vacuum evaporated dielectrics for use in MOS structures were studied in this research project. Dielectric films were deposited on substrates by electron bombardment evaporation of sapphire and quartz source materials. These deposited films were studied using infrared spectroscopy, index of refraction, density, and dielectric constant measurements. Etching tests were also...
    Resource Type:
    Dissertation
    Full Text:
    research. Gratitude is also expressed to Mr. John Kelley of the U.S. Bureau of Mines for providing the