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  • Metal Oxide Cluster Chemistries for Next Generation Nanomanufacturing

    Creator:
    Frederick, Ryan T.
    Abstract:
    Metal oxide clusters are promising inorganic photoresists in next generation nanomanufacturing because of their potential for high-resolution and low line-edge roughness patterning, and exceptional sensitivity to extreme ultraviolet (EUV) radiation. In EUV patterning, absorption of EUV radiation leads to electron emission that serve as a primary species for driving radiation...
    Resource Type:
    Dissertation
    Full Text:
    material is found near a surface or interface. In Figure 1.1, we illustrate the relative importance of a