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Filtering by: Date issued sim 2011-04-01 Subject Thin films

Atomic layer deposition of nanolaminate Al₂O₃-Ta₂O₅ and ZnO-SnO₂ films

Creator:

Smith, Sean Weston

Abstract:

Thin films are an enabling technology for a wide range of applications, from microprocessors to diffusion barriers. Nanolaminate thin films combine two (or more) materials in a layered structure to achieve performance that neither film could provide on its own. Atomic layer deposition (ALD) is a chemical vapor deposition technique...

Resource Type:

Masters Thesis