Index Catalog // ScholarsArchive@OSU

Start Over

Filtering by: Alternative title ssim Conduction processes in metal–insulator–metal diodes with Ta2O5 and Nb2O5 insulators deposited by atomic layer deposition Degree Level Master's

« Previous
Next »
1
2
3
4

ScholarsArchive@OSU

Atomic Layer Deposition (ALD) Process Development of Nb-doped TiO₂ as a Transparent Conducting Oxide (TCO) and ALD of HfO₂/Nb₂O₅ Bilayers as Insulating Barriers for Metal/Insulator/Insulator/Metal (MIIM) Diodes

Assessment of Barrier Heights between ZrCuAlNi Amorphous Metal and SiO₂, Al₂O₃, HfO₂, and ZrO₂ using Internal Photoemission Spectroscopy

Amorphous metal thin films as a platform for solution processing

Nucleation Inhibiting Mechanisms in Atomic Layer Deposition of Nanolaminates

Thermally-stable amorphous metal thin films

Atomic layer deposition of nanolaminate Al₂O₃-Ta₂O₅ and ZnO-SnO₂ films

Process optimization and electrical characterization of ZnS:Mn electroluminescent phosphors deposited by halide transport chemical vapor deposition

Amorphous multi-component metals as electrode materials

Atomic layer deposition of nanolaminate high-κ gate dielectrics for amorphous-oxide semiconductor thin film transistors

Oxide phosphors deposited by activated reactive evaporation for ACTFEL device applications

Limit your search

Academic Affiliation

Advisor

Commencement Year

Committee Member

Creator

Contributor

Date

Decade

Degree Field

Degree Level

Degree Name

File Format

Language

License

Non-Academic Affiliation

Peer Reviewed

Resource Type

Rights Statement

Subject

Search Constraints

Search Results

Limit your search