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Filtering by: Alternative title ssim Conduction processes in metal–insulator–metal diodes with Ta2O5 and Nb2O5 insulators deposited by atomic layer deposition Degree Name Master of Science (M.S.)

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ScholarsArchive@OSU

Atomic Layer Deposition (ALD) Process Development of Nb-doped TiO₂ as a Transparent Conducting Oxide (TCO) and ALD of HfO₂/Nb₂O₅ Bilayers as Insulating Barriers for Metal/Insulator/Insulator/Metal (MIIM) Diodes

Assessment of Barrier Heights between ZrCuAlNi Amorphous Metal and SiO₂, Al₂O₃, HfO₂, and ZrO₂ using Internal Photoemission Spectroscopy

Amorphous metal thin films as a platform for solution processing

Nucleation Inhibiting Mechanisms in Atomic Layer Deposition of Nanolaminates

Thermally-stable amorphous metal thin films

Atomic layer deposition of nanolaminate Al₂O₃-Ta₂O₅ and ZnO-SnO₂ films

Process optimization and electrical characterization of ZnS:Mn electroluminescent phosphors deposited by halide transport chemical vapor deposition

Amorphous multi-component metals as electrode materials

Atomic layer deposition of nanolaminate high-κ gate dielectrics for amorphous-oxide semiconductor thin film transistors

Oxide phosphors deposited by activated reactive evaporation for ACTFEL device applications

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