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Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma

Creator:

Hsu, Chia-Chang

Resource Type:

Dissertation

Full Text:

the plasma etching system. And I want to thank Sjamsie Husurianto and Amadou Camara who always
Modeling and simulation of CF₄/O₂ microwave plasma afterglows

Creator:

Camara, Amadou Tidiane

Abstract:

A gas phase kinetic model for the CF₄/O₂ microwave discharge plasma and afterglow of our laboratory has been developed. A reaction pathway identifying the major chemical reactions is proposed. The rate coefficients of the electron impact dissociation reactions are determined at three different plasma powers using both published electron molecule...

Resource Type:

Masters Thesis

Full Text:

functionality of the IC. One such challenge will originate from plasma assisted etching. Plasma etching is