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Filtering by: Subject Plasma etching Rights Statement In Copyright

Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures

Creator:

Venkataraman, Arjun

Abstract:

Plasma etching of polymers is an important process in the fabrication of integrated circuits, printed circuit boards and other emerging technologies. High rates can be obtained using oxygen diluted with a fluorine-containing gas, most commonly CF₄. In this thesis, two less studied fluorinated gases, NF₃ and SF₆ are investigated. Polyphenylene...

Resource Type:

Masters Thesis

Full Text:

. Koretsky Plasma etching of polymers is an important process in the fabrication of integrated circuits