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Filtering by: Subject Plasma etching Remove constraint Subject: Plasma etching Subject Afterglow (Physics) -- Mathematical models Remove constraint Subject: Afterglow (Physics) -- Mathematical models

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  • Modeling and simulation of CF₄/O₂ microwave plasma afterglows

    Creator:
    Camara, Amadou Tidiane
    Abstract:
    A gas phase kinetic model for the CF₄/O₂ microwave discharge plasma and afterglow of our laboratory has been developed. A reaction pathway identifying the major chemical reactions is proposed. The rate coefficients of the electron impact dissociation reactions are determined at three different plasma powers using both published electron molecule...
    Resource Type:
    Masters Thesis
    Full Text:
    functionality of the IC. One such challenge will originate from plasma assisted etching. Plasma etching is