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Filtering by: Subject Titanium dioxide Subject Atomic layer deposition

Atomic Layer Deposition (ALD) Process Development of Nb-doped TiO₂ as a Transparent Conducting Oxide (TCO) and ALD of HfO₂/Nb₂O₅ Bilayers as Insulating Barriers for Metal/Insulator/Insulator/Metal (MIIM) Diodes

Creator:

Lin, Shijia

Abstract:

Transparent conductive oxides (TCOs), primarily indium doped tin oxide, have been widely used in numerous fields since decades ago, such as solar cells, displays, OLEDs and ‘smart windows’ etc. Owing to the scarcity of indium, there is a great demand for new alternative materials. Metal/insulator/metal (MIM) diodes are a critical...

Resource Type:

Masters Thesis

Full Text:

- doped TiO2 films with precursors of titanium isopropoxide (Ti(OC3H7)4), niobium ethoxide (Nb(OC2H5)5