The
experimental
procedure
for
evaporating
silicon
monoxide
together
with
the
methods
for
measuring
the film
thickness
have
been
investigated.
The
effects
of
various
process
parameters
on
the
rate
of
deposition,
such
as
source
temperature
and
source-substrate
distance,
have
been
studied.
The
uniformity
of
silicon
monoxide
films
deposited
by
this
particular...
Vacuum evaporated dielectrics for use in MOS structures
were studied in this research project. Dielectric
films were deposited on substrates by electron bombardment
evaporation of sapphire and quartz source materials.
These deposited films were studied using infrared spectroscopy,
index of refraction, density, and dielectric constant
measurements. Etching tests were also...