This thesis focuses on two aspects of oxide-based thin-film transistors (TFTs), contact resistance and instability assessment.
First, determination of the contact resistance of indium tin oxide (ITO) on two wide-band gap semiconductors, zinc oxide (ZnO) and indium gallium oxide (IGO), is attempted and the effects of contact resistance on device...
The long-term goal of this research project is the development of solution-based inorganic dielectric and semiconductor materials for inkjet printed electronics. The main focus of this thesis involves testing of the materials and devices under development. A new solution-based inorganic dielectric material (HfOSO₄), given the name hafsox, is developed and...
Electron and neutron irradiation effects in InGaP/GaAs single heterojunction bipolar transistors are investigated in this thesis. Devices with different emitter sizes and grown by two different growth techniques were examined. Based on the physics of heterojunction bipolar transistors and concepts of radiation damage mechanisms, the irradiation effects were analyzed. The...
The objective of the research presented herein is to elucidate the effect of traps in determining amorphous oxide semiconductor thin-film transistor (AOS TFT) performance using modeling and characterization. A novel method is proposed to extract the interface state distribution from a TFT transfer curve. Analysis of zinc-indium oxide (ZIO), zinc-tin...
The primary focus of this thesis is modifying the comprehensive depletion-mode model and extending its applicability to p-channel thin-film transistor (TFT) behavior and subthreshold (subpinchoff) operation. The comprehensive depletion-mode model accurately describes depletion-mode TFT behavior and establishes a set of equations, different from those obtained from square-law theory, which can...
This thesis is an investigation of the characteristics of transistor-coupled logic using both theoretic and experimental methods. The steady state and transient behavior of the transistor are first investigated, especially as applied to the common emitter configuration. A number of references giving further information are cited.
Next, the characteristics of...
The bandgap voltage reference technique, as implemented in Silicon technology, has evolved to a state of advanced development and become the method of choice for temperature independent voltage biasing in integrated circuits. The heterojunction bipolar transistor (HBT), fabricated from epitaxial A1GaAs /GaAs, is developing to a point where basic circuit...
Split and normal gate A1GaAs /GaAs MODFETs were fabricated along with
the ohmic test structures and the Hall bar geometries. The DC characteristics of
normal gate transistors were evaluated at room temperature and at 77K and the
threshold voltages were extracted from the measurements and compared to the
theoretical results....
It has been verified by theoretical analysis, circuit simulation and test that two
switch transistors in parallel in a simple sample and hold circuit can be achieve high speed
with low error voltage due to charge injection. The wide transistor provides low RC time
constant when it is closed and...
As Si MOS approaches its maximum limits in speed and bandwidth, new
devices are desired to meet the needs of high speed communications and signal
processing. A device that exhibits superior performance to Si MOS, BJT, and
GaAs technology is the HEMT (high electron mobility transistor).
The HEMT offers superior...