Amorphous metal thin films lack the grain boundaries and dislocations present in
crystalline metal films. As a result, amorphous metal films can be more mechanically robust, atomically smooth, and more resistant to chemical attack than crystalline metals. However, amorphous metals are meta-stable and subject to crystallization upon heating, thus limiting...
The g-factor of the 482 Key (Kiloelectron volt) state in Ta¹⁸¹
and the half-lives of the 25.6 Key and 74.5 Key states in Dy¹⁶¹ have
been measured by the delayed coincidence method. The g-factor of
the 482 Key state in Ta¹⁸¹ was determined by observing the effects
of an external...
Nitrogen is a contaminant of niobium and tantalum adversely
affecting the workability of the metal. With recent interest in the
refractory metals, one problem the chemical analyst must solve
is the accurate determination of nitrogen in niobium and tantalum
at very low levels. The usual method of assaying for nitrogen...
The extraction of tantalum fluoride complexes by large cationic
extractants (tetraphenylarsonium ion, TPA, and crystal violet) and
by methyl isobutyl ketone (MIBK) has been investigated as a function
of fluoride concentration using ¹⁸² Ta as tracer. Extractions by the
cationic extractants into chloroform were carried out in the absence
of...
The erratic behavior of the room temperature yield strength of
high purity commercial tantalum sheet was studied. Critical factors
in the production process were postulated and then investigated to
determine their effects on strength properties. Chemical composition
was found to be the most important factor contributing to the strength;
thermomechanical...