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  • Metal-oxo Clusters as Novel Photolithographic Materials: How Understanding the Chemistry of HafSOx Informs Next-Generation Patterning Systems

    Creator:
    Amador, Jenn M.
    Abstract:
    The solution chemistry and kinetic behavior of hafnium peroxy sulfate solutions ("HafSOx") is described in terms of peroxide content and solution speciation. Additionally, thin film behavior, including thermal behavior and solubility, is characterized, and a mechanism of patterning is presented, as well as parameters that should be considered when looking...
    Resource Type:
    Dissertation
    Full Text:
    that shift are critically important. Photolithography depends on sharp contrast between the soluble

  • Metal Oxide Cluster Chemistries for Next Generation Nanomanufacturing

    Creator:
    Frederick, Ryan T.
    Abstract:
    Metal oxide clusters are promising inorganic photoresists in next generation nanomanufacturing because of their potential for high-resolution and low line-edge roughness patterning, and exceptional sensitivity to extreme ultraviolet (EUV) radiation. In EUV patterning, absorption of EUV radiation leads to electron emission that serve as a primary species for driving radiation...
    Resource Type:
    Dissertation
    Full Text:
    1.3 Patterning scheme in photolithography. Radiation species will leave the exposed regions more

  • Direct patterning of solution deposited metal oxides

    Creator:
    Stowers, Jason K.
    Abstract:
    Patterning of metal oxides typically involves a multi step process, involving depositing a resist, patterning that resist with some form of lithography, etching the oxide through the resist, and finally removing. This process can be simplified if the resist is removed and replaced with a metal oxide that can be...
    Resource Type:
    Dissertation
    Full Text:
    ................................................................. 1 Introduction to Photolithography...................................................... 3 The

  • Photoresist and ion-exchange chemistry of HafSOx

    Creator:
    Telecky, Alan J.
    Abstract:
    The chemistry of hafnium oxide based and materials are described in the context of ion exchange and lithography. HafSOx, represented by the composition HfO₂₋[subscript x](SO₄)x, is described to possess a significant capacity towards ion exchange in acidic and basic solutions, enabling films of HafSOx to be cleanly and readily be...
    Resource Type:
    Dissertation
    Full Text:
    Photolithography................................................... 15 Modern Lithography Overview