The chemistry of hafnium oxide based and materials are described in the context of ion exchange and lithography. HafSOx, represented by the composition HfO₂₋[subscript x](SO₄)x, is described to possess a significant capacity towards ion exchange in acidic and basic solutions, enabling films of HafSOx to be cleanly and readily be...
New alloys containing refractory metals have been developed
by the aero-space industry to meet the demand for thermally resistant
materials. The chemical analysis of these alloys has been
handled successfully by the use of ion exchange. Hydrofluoric acid,
either alone or combined with hydrochloric acid, has here-to-fore
been used to...