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Filtering by: Committee Member Wager, John Remove constraint Committee Member: Wager, John Subject Photolithography Remove constraint Subject: Photolithography

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  • Photoresist and ion-exchange chemistry of HafSOx

    Creator:
    Telecky, Alan J.
    Abstract:
    The chemistry of hafnium oxide based and materials are described in the context of ion exchange and lithography. HafSOx, represented by the composition HfO₂₋[subscript x](SO₄)x, is described to possess a significant capacity towards ion exchange in acidic and basic solutions, enabling films of HafSOx to be cleanly and readily be...
    Resource Type:
    Dissertation
    Full Text:
    relationship that I am eager to continue. I also extend much gratitude to my committee members Dr. John

  • Direct patterning of solution deposited metal oxides

    Creator:
    Stowers, Jason K.
    Abstract:
    Patterning of metal oxides typically involves a multi step process, involving depositing a resist, patterning that resist with some form of lithography, etching the oxide through the resist, and finally removing. This process can be simplified if the resist is removed and replaced with a metal oxide that can be...
    Resource Type:
    Dissertation