HafSOx is a dielectric material that also functions as an insulator. It is able to be spin-coated onto a silicon substrate, creating a thin, amorphous film. It is very dense, which helps lead it to a high dielectric constant, making it ideal for electronic devices through the use of lithography....
An inorganic aqueous precursor for the deposition of ZrO2 thin films via spincoating
was developed. Hydrolysis and condensation chemistries of
ZrOCl₂·8H₂O were used as the principal reactions to guide the synthesis.
Refractive index, n, for a film annealed at 300 °C at 550 nm was measured to
be n=1.97 by...